Multifunction ion plating equipment: 
 The equipment is mainly (set) DC magnetron sputtering, frequency sputtering and arc evaporation electronic integration of one of the three technologies, combined with linear deposition of ionization pulse granule bias can refine the properties of the film increased in metal products and non-metallic surface coated alloy film, compound film, multilayer film. After many years of dedicated research and development technical staff, through the unique cathodic arc and unbalanced magnetron plasma system, and developed a set of PROPOWER series of computer automatic control system, the density of the coating film adhesion, from the complex characteristics of a good degree of consistency to solve the complexity of manual operation, the film color inconsistencies and other issues. Widely used in watches, mobile phone shell, hardware, sanitary ware, tableware and requirements from the hard wear-resistant cutting tools, molds and so on. Plating Tin, TiCN, CrN, TiALN, TiCrN, ZrN, TiNC and various metal rock film (DLC). 
 1, is based on the principle of magnetron sputtering cathode glow discharge theory, the cathode surface the magnetic field extend to near the surface, from the increased rate of sputtered atoms. Not only to retain the detail-enhanced magnetron sputtering the surface gloss. 
 2, the arc plasma evaporation source, reliable performance, and the magnetic field structure in the optimization of the cathode coating 30A can be in the current work, coating film and substrate interface of atomic diffusion, but also has the characteristics of ion beam assisted deposition. 
 Model JTZ-800 JTL-1000 JTL-1250 
 Vacuum chamber size ￠ 800 × 1000MM ￠ 1000 × 1000MM ￠ 1250 × 1100MM 
 Coating method and more than six main configuration of a cylindrical arc source + target + a planar magnetron sputtering target eight rectangular arc source + twin (MF) magnetron sputtering of a planar rectangular magnetron target + sputtering target more than twelve arc source + twin (MF) magnetron sputtering target + two sets of flat rectangular magnetron sputtering target 
 Coating method and the main arc power supply configuration, DC magnetron power supplies, frequency magnetron power supply, filament power supply, pulse power, linear ionization source 
 Process gas control valve mass flow meter + magnetic ceramic 
 Vertical side of the vacuum chamber (single) door structure, the rear exhaust system, double water-cooled 
 Vacuum system composed of molecular pump + Roots pump + Mechanical pump (5.0 × 10-4PA) 
 Workpiece baking temperature to 500 degrees adjustable temperature control (PID temperature control), radiation heating 
 Workpiece rotation frequency control of public movement pattern, 0 ~ 20 r / min 
 Digital composite measurement gauges: measuring range from atmospheric to 1.0 × 10-5PA 
 Control Manual / Auto / PC / PLC + HMI / PC optional four ways 
 Note above the actual and equipment according to customer design and produce special requirements